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Peer-reviewed publication

2020 · Volume 9 · Issue 3 · Pages 3958-3966

Base-catalyzed synthesis of superhydrophobic and antireflective films for enhanced photoelectronic applications

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Authors and affiliations

  • Kareem ShefiuState Key Laboratory of Silicate Materials for Architectures, Wuhan University of Technology, Wuhan 430070, PR China
  • Yi Xie *State Key Laboratory of Silicate Materials for Architectures, Wuhan University of Technology, Wuhan 430070, PR ChinaDSAN NEW MATERIALS core team
  • Li TanState Key Laboratory of Silicate Materials for Architectures, Wuhan University of Technology, Wuhan 430070, PR China
  • Yanxi DingState Key Laboratory of Silicate Materials for Architectures, Wuhan University of Technology, Wuhan 430070, PR China
  • Emmanuel Acheampong TsiwahState Key Laboratory of Silicate Materials for Architectures, Wuhan University of Technology, Wuhan 430070, PR China
  • Abdelaal S.A. AhmedState Key Laboratory of Silicate Materials for Architectures, Wuhan University of Technology, Wuhan 430070, PR China
  • Junwu Chen *State Key Laboratory of Advanced Electromagnetic Engineering and Technology, Huazhong University of Science and Technology, Wuhan, PR ChinaDSAN NEW MATERIALS core team
  • Fen Qiao *School of Energy and Power Engineering, Jiangsu University, Zhenjiang, China
  • Zhi ChenWuhan Shuneng New Material Co., Ltd., Wuhan, PR ChinaDSAN NEW MATERIALS core team
  • Xiujian ZhaoState Key Laboratory of Silicate Materials for Architectures, Wuhan University of Technology, Wuhan 430070, PR China

DSAN NEW MATERIALS core team participation

Research experience connected with DSAN NEW MATERIALS' technical leadership.

All three DSAN NEW MATERIALS core team members are authors; Zhi Chen's declared affiliation is Wuhan Shuneng New Material Co., Ltd.

Yi Xie

co-author · corresponding author

Paper affiliation: Wuhan University of Technology

Junwu Chen

co-author · corresponding author

Paper affiliation: Huazhong University of Science and Technology

Zhi Chen

co-author · DSAN NEW MATERIALS company-affiliated author

Paper affiliation: Wuhan Shuneng New Material Co., Ltd.

01

Publisher abstract

Original abstract

In this work, a facile, cost-effective and environmentally friendly approach is developed to synthesize transparent silica sol for fabricating antireflective (AR) and superhydrophobic (SH) films on soda-lime glass. The transparent silica sol is prepared at room temperature by modification of hexamethyl disilazane (HMDS) on colloidal silica nanoparticles (NPs) which are synthesized via base-catalyzed hydrolysis of tetraethoxysilane (TEOS) in the presence of ammonia-free alkaline solution (i.e., NaOH). The AR and SH silica films are then achieved by dip-coating. The average transmittance, water static contact angle (CA) and sliding angle (SA) of the resulting film can reach 93.1%, 169.7° and 3.0°, respectively, exhibiting both AR and SH properties. In particular, the excellent SH and AR properties of the resulting film facilitate not only the excellent self-cleaning performance but also the increasing light transmittance and thus an enhanced power conversion efficiency (PCE) in photovoltaic module.

02

DSAN NEW MATERIALS editorial interpretation

Why this research matters to material applications.

All three DSAN NEW MATERIALS core team members participate in this paper, with Zhi Chen carrying the Wuhan Shuneng affiliation. The work extends the team's surface-engineering background into transparent, antireflective and self-cleaning films for photovoltaic applications; it should be read as research context rather than a claim for a current DSAN NEW MATERIALS product.

This explanation was prepared by DSAN NEW MATERIALS for engineering orientation. The original paper remains the authoritative source.

03

Research highlights

Key findings reported in the paper.

  1. 01

    An ammonia-free NaOH-catalyzed route and HMDS modification produce transparent silica sol at room temperature.

  2. 02

    The reported film reached 93.1% average transmittance, a 169.7-degree water contact angle and a 3.0-degree sliding angle.

  3. 03

    The coating combines antireflective, superhydrophobic and self-cleaning performance.

  4. 04

    Applying the film to a photovoltaic device increased reported power-conversion efficiency from 11.0% to 11.9%.

04

Paper navigation

Contents of the publication.

  1. 1 Introduction
  2. 2 Experimental
  3. 2.1 Chemicals and materials
  4. 2.2 Synthesis of transparent silica sol, AR and SH films
  5. 2.3 Transmission electron microscopy
  6. 2.4 Surface morphological characterization
  7. 2.5 Fourier transform infrared spectra
  8. 2.6 Optical spectroscopy
  9. 2.7 X-ray diffraction
  10. 2.8 Contact angle and sliding angle
  11. 2.9 Self-cleaning test
  12. 2.10 Enhancement of photovoltaic performance by AR and SH film
  13. 3 Results and discussion
  14. 4 Conclusions

05

Cite this research

Copy or export a checked citation record.

Shefiu K, Xie Y, Tan L, et al. Base-catalyzed synthesis of superhydrophobic and antireflective films for enhanced photoelectronic applications. Journal of Materials Research and Technology. 2020;9(3):3958-3966. doi:10.1016/j.jmrt.2020.02.022.

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